00944na  a2200229   4500001001300000005001500013008004100028024002700069035001800096035002700114100002200141370004800163372005300211373006100264374004800325375001100373377002200384400002600406670015800432670005400590670007000644KAC20183013220240730111817180516 b aznnnaabn          fa aaa      7 a00000004649147922isni  a(KRI)10089429  a(KISTI)ADPER00001047311 a황진하,d1966-  c한국(국명)[韓國]0KSH20000101452nlsh  a재료 공학[材料工學]0KSH19980184182nlsh  a홍익대학교 신소재공학전공 (교수)s20020301  a교수(대학)[敎授]0KSH19980114932nlsh  a남성  l한국어l영어1 aHwang, Jin-ha,d1966-  aApplication of rapid thermal annealing to activation in low temperature polycrystalline si thin films, (한국반도체디스플레이기술학회), 2007  a한국연구자정보(KRI)uhttps://www.kri.go.kr  a한국과학기술정보연구원(KISTI)uhttps://www.kisti.re.kr