00740na  a2200193   4500001001300000005001500013008004100028024002700069035001800096035002700114100003400141370004800175372004600223374005700269375001100326377001400337670014100351670005400492KAC20187593320200728093612180723 b aznnnaabn          fa aaa      7 a00000004680322792isni  a(KRI)11123798  a(KISTI)ADPER68002625961 a반원진,g潘元珍,d1985-  c한국(국명)[韓國]0KSH20000101452nlsh  a물리학[物理學]0KSH19980143642nlsh  a연구원(연구자)[硏究員]0KSH19980377142nlsh  a남성  l한국어  aMetal-oxide doped carbon films deposited by PECVD with high etch selectivity for semiconductor hardmask, (Sungkyunkwan University), 2019  a한국연구자정보(KRI)uhttps://www.kri.go.kr