00815na  a2200181   4500001001300000005001500013008004100028024002700069035002700096100002600123370004800149372005300197374005700250377001400307400001800321670022300339670007100562KAC2018G922420200723135046180921 b aznnnaabn          fa aaa      7 a00000004687687022isni  a(KISTI)ADPER68024164261 a고무현,g高武鉉  c한국(국명)[韓國]0KSH20000101452nlsh  a화학 공학[化學工學]0KSH19980084672nlsh  a연구원(연구자)[硏究員]0KSH19980377142nlsh  l한국어1 aKoh, Moo-hyun  aDivergent processes for the C9 to C15 monomers of polyamide from vegetable olis and synthesis of the dissolution inhibitors and the negative tone photoresists for ArF photolithography, (Seoul National University), 2015  a한국과학기술정보연구원(KISTI)uhttps://www.kisti.re.kr/