학위논문
Modeling, detection and protection schemes for extreme ultraviolet lithography (EUVL) mask carrier systems
표제/저자사항 Modeling, detection and protection schemes for extreme ultraviolet lithography (EUVL) mask carrier systems / by Se-Jin Yook
발행사항 Ann Arbor, Mich. : UMI Dissertation Services, c2007
형태사항 xxi, 171 p. : ill. ; 23 cm
주기사항 Thesis (Ph.D.) -- University of Minnesota, Mechanical Engineering, 2006
Includes bibliographical references (p. 164-171)
전자자료: http://search.proquest.com/docview/304837737?accountid=8015
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