학위논문
Metal-oxide doped carbon films deposited by PECVD with high etch selectivity for semiconductor hardmask
표제/저자사항 Metal-oxide doped carbon films deposited by PECVD with high etch selectivity for semiconductor hardmask / Wonjin Ban
발행사항 Seoul : Sungkyunkwan University, 2019
형태사항 101 pages : illustrations (some color) ; 30 cm
주기사항 Adviser: Donggeun Jung
Thesis(Ph.D.) -- Graduate School, Sungkyunkwan University, Concentration in Condensed Matter Physics, Department of Physics, 2019
Includes bibliographical references
전자자료: http://www.riss.kr/link?id=T15072912
In English; summary in Korean
분류기호 한국십진분류법-> 420.4듀이십진분류법-> 530.4
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