기사
Formation and technology of SiOF films as intermetal dielectric by helicon wave plasma CVD
표제/저자사항 Formation and technology of SiOF films as intermetal dielectric by helicon wave plasma CVD / Chi Kyu Choi, Kwang Man Lee, Duk-soo Kim, Hong-Young Chang
형태사항 p. 65-76; 27 cm
주기사항 수록자료: 基礎科學硏究-濟州大學校 基礎科學硏究所. 濟州大學校 基礎科學硏究所. 8卷 1號(1995), p. 65-76 8:1<65 상세보기 ISSN 1225-3200
저자: Chi Kyu Choi, Department of Physics, Cheju National University
저자: Kwang Man Lee, Department of Electronic Engineering, Cheju National University
저자: Duk-soo Kim, Department of Chemistry, Cheju National University
저자: Hong-Young Chang, Department of Physics, Korea Advanced Institute of Science and Technology
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