기사
A study on the influence of carbon contents on dielectric constant of SiOC films by thermal treatment = 탄소가 첨가된SiO₂박막의 열처리에 따른 탄소 농도 영향에 대한 연구
표제/저자사항 A study on the influence of carbon contents on dielectric constant of SiOC films by thermal treatment = 탄소가 첨가된SiO₂박막의 열처리에 따른 탄소 농도 영향에 대한 연구 / Chang Sil Yang, Young-Hun Yu, Kwang-Man Lee, Heon-Ju Lee, Chi Kyu Choi
형태사항 p. 1-6; 27 cm
주기사항 수록자료: 基礎科學硏究-濟州大學校 基礎科學硏究所. 濟州大學校 基礎科學硏究所. 15卷 1號(2002), p. 1-6 15:1<1 상세보기 ISSN 1225-3200
저자: Chang Sil Yang, Department of Physics Cheju National University
저자: Young-Hun Yu, Department of Physics Cheju National University
저자: Kwang-Man Lee, Faculty of Electrical and Electronic Engineering, Research Institute of Advanced Technology, Cheju National University
저자: Heon-Ju Lee, Faculty of Mechanical, Energy and Production Egineering, Research Institute of Advanced Technology, Cheju National University
저자: Chi Kyu Choi, Department of Physics Cheju National University
출처 국립중앙도서관 바로가기
담당부서 : 국가서지과 (02-590-6339)
위로