학위논문
A study of particle formation and transport during thermal chemical vapor deposition CVD of silicon dioxide films and high-densigy plasma CVD of poly silicon films
표제/저자사항 A study of particle formation and transport during thermal chemical vapor deposition CVD of silicon dioxide films and high-densigy plasma CVD of poly silicon films / by Taesung Kim
발행사항 Ann Arbor, MI: UMI, 2002
형태사항 xiv, 160 p.: ill.; 22cm
주기사항 Thesis(Ph.D.) -- Graduate School of the Univ. of Minnesota, 2002.
Bibliography: p. 160.
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