학위논문
Study for reduction of interface and bulk defect density in thin film transistor according to plasma conditions
표제/저자사항 Study for reduction of interface and bulk defect density in thin film transistor according to plasma conditions / Dong Hyeok Lee
발행사항 Seoul : Korea University, 2017
형태사항 83 leaves : illustrations ; 26 cm
주기사항 Adviser: 홍문표
Thesis(Ph.D.)-- Graduate School, Korea University, Department of Applied Physics, 2017
Bibliography: leaves 74-81
전자자료: http://www.riss.kr/link?id=T14549248
In English; summary in korean
분류기호 한국십진분류법-> 420듀이십진분류법-> 530
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