학위논문
Attenuated phase shift mask using platinum phase shifter for high numerical aperture extreme ultraviolet lithography
표제/저자사항 Attenuated phase shift mask using platinum phase shifter for high numerical aperture extreme ultraviolet lithography / Jung Sik Kim
발행사항 Seoul : Hanyang University, 2019
형태사항 xiii, 80 leaves : illustrations ; 26 cm
주기사항 Adviser: Jinho Ahn
Thesis(Ph.D.) -- Graduate School of Hanyang University, Department of Nanoscale Semiconductor Engineering, 2019
Bibliography: leaves 71-75
전자자료: http://www.riss.kr/link?id=T15322827
In English; summary in Korean
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